Nanomaterials PVD reactor


01PVD reactor


  • Layer engineering / deposition systems
  • Chamber with a diameter of 500 mm and a target diameter of 150 mm

PVD (physical vapor deposition – magnetron sputtering) – this process uses the phenomena of metal/alloy evaporation, sputtering, ionization of gases and crystallization of specific phases from plasma on a selected substrate. Coatings are applied on a cold substrate or heated to a temperature of 200-500 °C. The substrate-coating connection is adhesive.

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